RADIATIVE HEATER FOR A SPUTTERING SYSTEM

Netzahualcoyotl Carlos–Ramirez; Jes�s Carrillo–L�pez; Enrique Rosendo–Andr�s

Volume : IV, Issue : VII, July - 2015

RADIATIVE HEATER FOR A SPUTTERING SYSTEM

Netzahualcoyotl Carlos Ndash Ramirez, Jes S Carrillo Ndash L Pez, Enrique Rosendo Ndash Andr S

Abstract :

The design and construction of a Radiative heater, for use in sputtering system is presented. An aluminum paraboloid mirror and a halogen lamp are used to heat the substrate, radiative heating presents as main advantage over other commercial options, low power consumption (about 90w for 300C), their relative easy to build and the ability to maintain a stable deposition temperature. The radiative heater, operating in the temperature range of 150 to 300C, and pressures between 3 and 15 mTorr, shows a minimal variation of temperature and its current consumption is less than 1.0A. The main limitation is that the heater is used with an open–loop control, which does not allow the possibility of controlling temperatures below 140C and stabilize the temperature in less than 40 min. Characterization of two halogen lamps of 300W and 150W, with which it is possible to obtain different temperature ranges is shown.