DEPOSITION OF Al�DOPED ZnO THIN FILMS BY SPRAY PYROLYSIS FOR PHOTOELECTROCHEMICAL APPLICATIONS

R.M. Mohite

Volume : VI, Issue : X, October - 2016

DEPOSITION OF Al�DOPED ZnO THIN FILMS BY SPRAY PYROLYSIS FOR PHOTOELECTROCHEMICAL APPLICATIONS

R. M. Mohite

Abstract :

Al–doped zinc oxide (AZO) thin films have been prepared by spray pyrolysis method. The used spray solution has 0.5 M solution of zinc nitrate hexahydrate and 1 to 10 at.% aluminium chloride. A Photoelectrochemical (PEC) cell with configuration n–AZO ? NaOH (1M) ? S (1M) + Na2S (1M) ? C(graphite) were formed. The PEC cell characterization of the films was carried out by studying current–voltage (I–V) measurements in dark. C–V measurements were taken to determine flat–band potential (Vfb). J–V measurements for a PEC cell in UV light (λ ~ 380 nm) were carried out to determine short circuit current (Isc), open circuit voltage (Voc), fill factor (FF) and power conversion efficiency (η). The junction ideality factor (ηif) and Vfb were found to be 1.2 and 0.1 V, respectively. The measurements of power output characteristic of AZO5 at.% shows Voc, Isc, FF and η were found to be 0.38 V, 38.42 μA, 50.56% and 0.1476 %, respectively