Volume : IV, Issue : V, May - 2014

Physical Properties of Sputtered CdTe Thin Films

E. Camacho Espinosa, E. Rosendo, A. I. Oliva, T. D Az, N. Carlos Ram Rez , H. Ju Rez, G. Garc

Abstract :

In this work, CdTe thin films were deposited on glass substrates by sputtering technique at different pressures and rf–power conditions. Morphology, growing parameters, and the crystalline structure were studied as a function of the work pressure (2 to 40 mTorr) and the rf–power (25 to 45 W). The deposition rate increases from 1.5 to 6.0 nm/min when the work pressure decreases. In a similar way, the deposition rate changes from 2.5 to 6.0 nm/min when the rf–power ranges from 25 to 45 W. The optical bandgap energy values of the deposited CdTe films ranged from 1.36 to 1.6 eV.The surface roughness of the films was found to be independent on the work pressure and the rf–power conditions. The crystalline structure of the deposited films improves for lower work pressures and higher rf–powers. Better conditions for films deposition were found at 5 mTorr and 35 W

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Article: Download PDF   DOI : 10.36106/ijar  

Cite This Article:

E. Camacho-Espinosa, E. Rosendo, A.I. Oliva, T. Díaz, N. Carlos-Ramírez , H. Juárez, G. García, M. Pacio Physical Properties of Sputtered Cdte Thin Films Indian Journal of Applied Research, Volume.4, Issue.5, May-2014

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